In掺杂CdO基透明导电薄膜性能优化研究

摘要：透明导电薄膜在当今的科学和生产生活中有着广泛的应用，比如说太阳能电池、平面显示、航天航空等领域，国家的军工产业链方面如巡航导弹等也急需要透明导电薄膜作为材料支撑。CdO薄膜在诸多透明导电薄膜中是一种特殊晶体结构的材料，并且其直接带隙也是和其他的薄膜物质有着区别，比如其禁带宽度为2.3eV，这也是和其他物质材料不一样，有较高的透光效果、载流子的浓度与其他薄膜比较也是偏低的，在实验室中的进行实验时成本较低廉，并且在正常实验条件下易获得溅射物沉积物等优异的性能特点而更备受关注。但是CdO透明导电薄膜光学带隙较小、在人眼可见的光的范围可能透过的概率偏低等等，这些性能上的不足严重限制了其应用范围。在此基础上利用其它元素掺杂能有效地改善这些缺陷。本篇论文主要研究运用磁控溅射法制备的不同薄膜样品做分析In掺杂CdO透明薄膜致使其结构，电学，光学方面性能改变情况，得到最终的优化结论。

关键词：透明导电薄膜，铟掺杂氧化镉薄膜，薄膜性能优化研究，磁控溅射法制备薄膜

Abstract: Transparent conductive films are widely used in today's science and production life. For example, solar cells, plane display, aerospace and other fields, such as the military industrial chain of the state, such as cruise missiles, also need transparent conductive film as material support. CdO film is a special crystal structure material in many transparent conductive films, and its direct band gap is not the same as other thin film materials, such as its band gap is 2.3eV, which is not the same as other material materials. It has higher light transmittance, carrier concentration and other thin films. In the laboratory, the cost of the experiment is low, and it is more concerned about the excellent performance characteristics such as the easy to obtain the sputtering sediments under normal experimental conditions. But the optical band gap of the CdO transparent conductive film is smaller, the probability of the visible light in the human eye is low, and so on. The lack of these properties seriously limits its application. On the basis of these, other elements doping can effectively improve these defects. This paper mainly deals with the analysis of different thin film samples prepared by magnetron sputtering to analyze the structure, electrical and optical properties of In doped CdO transparent thin films, and the final optimization conclusion is obtained.

Keywords: Transparent conductive film，Indium doped cadmium oxide film，Study on film performance optimization，Thin films prepared by magnetron sputtering

1引言 1

1.1课题研究背景 1

1.2透明导电薄膜的研究现状 1

2制备透明导电薄膜 2

2.1磁控溅射法制备透明导电薄膜 2

2.2过滤阴极电弧法制备透明导电薄膜 2

3 氧化镉薄膜的结构表征 3

3.1CdO透明导电薄膜的结构 3

3.2CdO透明导电薄膜的表面形貌 3

4In掺杂含量对CdO：In薄膜性能优化研究 4

4.1In掺杂含量对CdO：In薄膜结构性能的影响 4

4.2In掺杂含量对CdO:In薄膜表面形貌的影响 6

4.3In掺杂含量对CdO:In薄膜电学性能的影响 7

4.4In掺杂含量对CdO:In薄膜光学性能的影响 In掺杂CdO基透明导电薄膜性能优化研究:http://www.chuibin.com/wuli/lunwen_205212.html